Page last updated: 2024-11-05

2-thiosalicylic acid and Dermatitis, Contact, Photoallergic

2-thiosalicylic acid has been researched along with Dermatitis, Contact, Photoallergic in 1 studies

2-thiosalicylic acid: a degradation product of thimerosal; RN given refers to parent cpd
thiosalicylic acid : A sulfanylbenzoic acid that is the 2-sulfanyl derivative of benzoic acid.

Research Excerpts

ExcerptRelevanceReference
"Moreover, the induction of contact sensitivity against TMS or TOS induced photosensitive cross-reactivity to PXM, but not to TXM."1.29Piroxicam has at least two epitopes for contact photoallergy. ( Hariya, T; Ikezawa, Z; Kitamura, K; Osawa, J, 1993)

Research

Studies (1)

TimeframeStudies, this research(%)All Research%
pre-19900 (0.00)18.7374
1990's1 (100.00)18.2507
2000's0 (0.00)29.6817
2010's0 (0.00)24.3611
2020's0 (0.00)2.80

Authors

AuthorsStudies
Hariya, T1
Osawa, J1
Kitamura, K1
Ikezawa, Z1

Other Studies

1 other study available for 2-thiosalicylic acid and Dermatitis, Contact, Photoallergic

ArticleYear
Piroxicam has at least two epitopes for contact photoallergy.
    Journal of dermatological science, 1993, Volume: 6, Issue:3

    Topics: Administration, Oral; Animals; Anti-Inflammatory Agents, Non-Steroidal; Benzoates; Cross Reactions;

1993